Education

  • LL.M.,New York University School of Law, Wallace Scholar
  • Juris Doctor, Northwestern University School of Law, Dean’s List
  • LL.B., Fudan University, Shanghai, China, with honors
  • Bachelor of Engineering, Peking University, Beijing, China

Associations

  • Admitted to practice law in the state of Washington
  • Limited recognition to practice before the US Patent and Trademark Office
  • Qualified to practice before China State Intellectual Property Office
  • Passed the China National Bar Examination
  • Passed the New York State Bar Examination
  • Passed U.S. Uniform Certified Public Account (CPA) Exams

David received law degrees from both China and the U.S. and has considerable experience in intellectual property counseling. Prior to joining Lee & Hayes, David worked for several leading U.S. law firms in Shanghai, China and has substantial working experience in intellectual property counseling, technology transfer and licensing between the U.S. and China. He also obtained substantial U.S. litigation experience as a law clerk for the Illinois Attorney General's Office, Antitrust Bureau and a litigation law firm in Chicago.